Total Reflection X-Ray Fluorescence Spectroscopy
نویسندگان
چکیده
منابع مشابه
Synchrotron radiation-induced total reflection X-ray fluorescence analysis
Synchrotron radiation-induced total reflection X-ray fluorescence (SR-TXRF) analysis is a high sensitive analytical technique that offers limits of detection in the femtogram range for most elements. Besides the analytical aspect, SR-TXRF is mainly used in combination with angle-dependent measurements and/or X-ray absorption near-edge structure (XANES) spectroscopy to gain additional informatio...
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As dimensions in state-of-the-art CMOS devices shrink to less than 0.1 pm, even low levels of impurities on wafer surfaces can cause device degradation. Conventionally, metal contamination on wafer surfaces is measured using Total Reflection X-Ray Fluorescence Spectroscopy (TXRF). However, commercially available TXRF systems do not have the necessary sensitivity for measuring the lower levels o...
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Total Reflection X-ray Fluorescence (TXRF) using Synchrotron Radiation from the Stanford Synchrotron Radiation Laboratory (SSRL) has been used to study Al impurities on Si wafer surfaces. For primary excitation energies below the Si K absorption edge an inelastic resonance scattering due to resonant xray Raman scattering is observed. This scattering dominates the background behavior of the Al K...
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Strong characteristic Kα X-ray lines are accompanied by weak lines due to the radiative Auger effect (RAE) [1, 2]. The characteristic Kα fluorescent X-rays (K-L2,3 lines) are emitted by the 2p→1s electric dipole transition after one of the 1s electron photoionization, Though the probability is less than 0.01, one of the 2p electrons is excited into an unoccupied discrete or continuum level simu...
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ژورنال
عنوان ژورنال: OALib
سال: 2020
ISSN: 2333-9721,2333-9705
DOI: 10.4236/oalib.1106671